201919th International Congress of Metrology
|Number of page(s)
|Temperature / Température
|23 September 2019
Influence of low temperature annealing on Nickel RTDs designed for heat flux sensing
FEMTO-ST Institute UMR 6174, CNRS-University Bourgogne Franche-Comté-ENSMM-UTBM, 2 avenue Jean Moulin, 90000 Belfort France
2 UTINAM Institute, UMR 6213, CNRS-University Bourgogne Franche-Comté, 16, Route de Gray 25030 BESANCON Cedex France
In this paper, we study the influence of annealing on the performance of Resistive Temperature Detectors made from Nickel thin films. The aimed application is heat flux sensing. The substrate is made of Borofloat glass with a Chromium adhesive layer. Several annealing temperatures between 150°C and 300°C are applied to this assembly. The thin films as deposited and after annealing are analyzed through SEM images. The evolution of the resistance and the temperature coefficient of the sensor are discussed. An annealing temperature is selected that ensures the repeatability of measurements.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.